書誌事項
- タイトル別名
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- Quantitative Analysis of Thin Titanium Nitride Coatings with X-ray Microanalyzer
- Xセン マイクロアナライザー ニ ヨル チタン チッカブツ ハクソウ ヒマク
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説明
Electron-probe X-ray microanalysis is convenient and practical for quantitative analysis of titanium nitride films as hard coatings. However, the conventional ZAF correction method is not applicable to thin coatings because the electron beam penetrates into a substrate. This paper concerns a quantum-theoretical analysis of thin coatings by EPMA and verification of its validity. The new analysis has been established based on the ZAF method; the analysis is given as a function of mass thickness, ρ×t, where ρ and t are the density and the thickness of coatings respectively. Analysis of titanium nitride coatings was carried out at electron beam voltages over the range of 6 to 28 kV. For a coatings as thin as 0.54 μm, the chemical compositions of Ti calculated from the present analysis remained constant in the above voltage range, whereas those from the ZAF method decreased monotonically with increasing in voltage over 12 kV. On the contrary, for a thick coatings 12.55 μm in thickness, the compositions obtained from both models were independent of the beam voltages. These results show that the present method is effective in the analysis of thin coatings.
収録刊行物
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- 日本金属学会誌
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日本金属学会誌 58 (4), 461-467, 1994
公益社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390001206490551680
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- NII論文ID
- 130007341214
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- NII書誌ID
- AN00187860
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- ISSN
- 18806880
- 24337501
- 00214876
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- NDL書誌ID
- 3881504
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- データソース種別
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- JaLC
- NDL
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