Effects of Pressure on PbTiO<SUB>3</SUB> Thin Film Prepared by Low-Pressure Thermal Plasma Deposition

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  • Nagata Shingo
    Department of Inorganic Materials, Faculty of Engineering, Tokyo Institute of Technology
  • Wakiya Naoki
    Department of Inorganic Materials, Faculty of Engineering, Tokyo Institute of Technology
  • Shinozaki Kazuo
    Department of Inorganic Materials, Faculty of Engineering, Tokyo Institute of Technology
  • Masuda Yoshio
    Superconductivity Research Laboratory, International Superconductivity Technology Center
  • Mizutani Nobuyasu
    Department of Inorganic Materials, Faculty of Engineering, Tokyo Institute of Technology

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  • 減圧熱プラズマ成膜法によるチタン酸鉛PbTiO<SUB>3</SUB>薄膜の合成に及ぼす成膜圧力の影響
  • 減圧熱プラズマ成膜法によるチタン酸鉛PbTiO3薄膜の合成に及ぼす成膜圧力の影響
  • ゲンアツ ネツ プラズマセイマクホウ ニ ヨル チタンサン ナマリ PbTiO3 ハクマク ノ ゴウセイ ニ オヨボス セイマク アツリョク ノ エイキョウ

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Abstract

PbTiO3 thin films were prepared by low-pressure thermal plasma deposition method on (100)MgO substrates. The mists of the mixed solution of each metal alkoxides and 2-methoxyethanol were introduced into a plasma flame and deposited onto substrates. The constituent phases, the crystal texture and the surface morphology were drastically changed by the chamber pressure. Over 13332 Pa, single phase PbTiO3 films were obtained. They were grown epitaxially and their surface morphology was composed of rectangular shaped grains. The remnant polarization and coercive field of the film from the hysteresis loop were about 0.104 C·m−2 and 5.12 MV·m−1, respectively.

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