Possibility of Observation of Water Film by Measuring Surface Potential Distribution
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- Masuda Hiroyuki
- National Research Institute for Metals
Bibliographic Information
- Other Title
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- 表面電位分布測定による水膜観察の可能性
- ヒョウメン デンイ ブンプ ソクテイ ニ ヨル スイ マク カンサツ ノ カノウセイ
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Abstract
Previous AFM observation showed that small water droplets and water film were observed on the surface when pure water or aqueous solution was poured on graphite or mica. However, when the specimen surface was dirty and too rough to observe very thin water film like roughly polished metal surface, we cannot decide whether the water film exists or not. The possibility of measurement of water film distribution by surface potential measurement was studied. As the result, it is proved that surface potential becomes low when the water film exists and the thin water film which cannot be distinguished from the surface shape can be observed by measuring the surface potential distribution.
Journal
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- Journal of the Japan Institute of Metals and Materials
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Journal of the Japan Institute of Metals and Materials 62 (12), 1183-1188, 1998
The Japan Institute of Metals and Materials
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Details 詳細情報について
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- CRID
- 1390001206491595264
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- NII Article ID
- 10002548298
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- NII Book ID
- AN00187860
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- ISSN
- 18806880
- 24337501
- 00214876
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- NDL BIB ID
- 972833
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed