Thermal Hydrogen Desorption Spectroscopy of Hydrides Formed in the Surface Layer of an Electrochemically Treated TiAl Based Alloy

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  • 電気化学的に処理したTiAl基合金表面に形成される水素化物の昇温水素脱離特性
  • デンキ カガクテキ ニ ショリシタ TiAlキ ゴウキン ヒョウメン ニ ケイ

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Decomposition of hydrides formed in the surface layer of a TiAl-based alloy by an electrochemical treatment in sulfuric acid solution was studied by thermal desorption spectroscopy (TDS) combined with quadrupole mass spectroscopy (QMS), and X-ray diffractometry (XRD).<BR>Two peaks in the TDS curve and the results of QMS supported the presence of two hydrides in the alloy which was suggested by a previous study. XRD showed that the tetragonal hydride decomposed at 400 K corresponds to the first peak in TDS curve and the hexagonal hydride decomposed at 500 K corresponds to the second peak. The lattice parameters of the tetragonal hydride are a=0.455 nm and c=0.463 nm and these of the hexagonal hydride are a=0.523 nm and c=0.448 nm. The reason why two hydrides were formed is discussed.

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