ポリスチレン／ポリメチルフェニルシロキサン混合系の相分離後期過程における構造関数

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  • Form of structure function observed in phase separation process of polystyrene(PS)/poly(methylphenylsiloxane)(PMPS) liquid mixtures.
  • ポリスチレン ポリメチルフェニルシロキサン コンゴウケイ ノ ソウ ブンリ コ

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The phase separation process of polystyrene (PS) /poly (metylphenylsiloxane) (PMPS) liquid mixtures was investigated by light scattering. In order to test the scaling law S (k, t) =km-3s (k/km), which represents the self-similarity of the phase structure, we tried to superpose the measured structure function S (k, t) . Here k is the wave nunber, km the wave number yielding the maximum intensity and s (k/km) the scaled structure function independent of time t. The superposition for the critical composition was fairly good. However, S (k, t) for off-critical compositions gradually changed with t, coming to have a broader peak, so that the superposition was not so good. The observed exponent describing the wave number dependence at k>km was near the one given by Porod's law, i. e., -4, for both the critical and off-critical compositions. However, the conservation law ∫∞0 [k4s (k, t) -2πA] dk=0 proposed by Tomita, qualitatively held only for off-critical compositions.

収録刊行物

  • 高分子論文集

    高分子論文集 47 (5), 439-443, 1990

    公益社団法人 高分子学会

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