A deep UV contrast enhanced material using 5-diazo-Meldrum's acid.

DOI
  • ENDO Masayuki
    Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
  • SASAGO Masaru
    Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
  • HIRAI Yoshihiko
    Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
  • OGAWA Kazufumi
    Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.
  • ISHIHARA Takeshi
    Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.

Bibliographic Information

Other Title
  • ５‐ジアゾ‐メルドラム酸を用いた遠紫外線コントラスト・エンハンスト材料

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Description

A new contrast enhanced lithography (CEL) material for deep UV was developed. The material is made of 5-diazo-Meldrum's acid, a p-cresol formaldehyde novolac resin and diethyleneglycol dimethyl ether. It has a good contrast enhancing effect at 248 nm, and its application to KrF excimer laser lithography seems to be very useful.

Journal

  • KOBUNSHI RONBUNSHU

    KOBUNSHI RONBUNSHU 45 (5), 453-455, 1988

    The Society of Polymer Science, Japan

Keywords

Details 詳細情報について

  • CRID
    1390001206522679296
  • NII Article ID
    130003837145
  • DOI
    10.1295/koron.45.453
  • ISSN
    18815685
    03862186
  • Text Lang
    ja
  • Data Source
    • JaLC
    • Crossref
    • CiNii Articles
  • Abstract License Flag
    Disallowed

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