Electron- and Photo-sensitivity of Allyl Esterlfied Poly (methyl acrylate)

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  • SHIMOKAWA Yoichi
    Pioneering Research and Development Laboratories, Toray Industries, Inc.
  • MIYAMA Hajime
    Department of Materials Science and Technology, Technological University of Nagaoka

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Other Title
  • 橋かけ型感電子線感光性高分子　ＩＩＩ　　アリルエステル化アクリル酸メチル共重合体の感電子線性，感光性
  • アリルエステルカ アクリルサン メチル キョウジュウゴウタイ ノ カン デンシ

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Abstract

Allyl ester groups have been introduced into polymers and copolymers of methyl acrylate by ester-interchange reactions with allyl alcohol. Polymers obtained exhibit good sensitivity to electron and also to light by the addition of photosensitizers. The sensitivity has been found to be proportional to the weight average molecular weight of a base polymer and also to the square of allyl ester group concentration. Copolymers with styrene exhibit a sensitivity better than homopolymers.

Journal

  • KOBUNSHI RONBUNSHU

    KOBUNSHI RONBUNSHU 36 (6), 415-418, 1979

    The Society of Polymer Science, Japan

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