Applications of high-ortho novolak resins to photoresist materials.

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Other Title
  • ハイオルソノボラック樹脂のポジ型フォトレジストへの応用
  • ハイオルソ ノボラック ジュシ ノ ポジガタ フォトレジスト エ ノ オウヨウ

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Description

High-ortho Novolak resins having high contents of ortho-ortho bonding structure were applied to positive photoresist materials. It was found that there is an optimum value of ortho-ortho bonding content in terms of the resist sensitivity. Heat resistivity of the photoresists decreases but the resolution capability is improved greatly when high-ortho Novolak resins are used. These results indicate that the azocoupling reaction between Novolak resins and quinonediazide compounds are concerned with the image formation mechanism in high-ortho Novolak resin/quinonediazide systems.

Journal

  • KOBUNSHI RONBUNSHU

    KOBUNSHI RONBUNSHU 45 (10), 803-808, 1988

    The Society of Polymer Science, Japan

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