Electron-and Photosensitivity of <I>N</I>-Allyloxymethyl-polyamide

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  • SHIMOKAWA Yoichi
    Pioneering Research and Development Laboratories, Toray Industries, Inc.
  • MIYAMA Hajime
    Department of Materials Science and Technology, Technological University of Nagaoka

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Other Title
  • 橋かけ型感電子線性高分子　Ｉ　　Ｎ‐アリロキシメチル化ポリアミドの感電子線性および感光性
  • N アリロキシメチルカ ポリアミド ノ カン デンシセンセイ オヨビ カンコウ

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Abstract

N-Allyloxymethyl-poly (ε-caproamide), prepared by the reaction of formaldehyde and allyl alcohol with poly (ε-caproamide) in the presence of formic acid, has been found to be a highly-sensitive electron-crosslinkable polymer. Polyamides of N-allyloxymethylation degrees over 25 to 30% are soluble in alcoholic solvents, such as methanol and ethanol-water mixture, and are conveniently usable for electron beam lithography. Polymer with 35 to 40% N-allyloxymethylation degree exhibits the best lithographic qualities, the minimum exposure for insolubilization being 5×10-8 coulomb/cm2. This high sensitivity, together with an excellent resolution, makes it one of the most promising materials for electron beam lithography. By addition of photosensitizers, such as aromatic ketones, it can be utilized as a photocrosslinkable material.

Journal

  • KOBUNSHI RONBUNSHU

    KOBUNSHI RONBUNSHU 36 (3), 169-174, 1979

    The Society of Polymer Science, Japan

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