Studies on P-Q Photographic Monobaths (VII)

DOI

Bibliographic Information

Other Title
  • P-Q一浴現像定着液の研究 (第7報)
  • The Influence of Exposure Level on the Development Process
  • 露光量の大小による現像過程の相違

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Description

The influence of exposure level variations on developed silver obtained by monobath-processing were investigated. Experiments performed with P-Q monobaths containing thiocyanate and thiosulf ate as fixing agents, using a high-speed negative film, indicate that the grain structure of developed silver at lower exposure level are larger and more compact than that at higher exposure level. When compared with corresponding nonfixing developer at equal exposure levels, such monobaths tend to produce considerably more silver and faster development rate at lower exposure level, but this tendency is entirely reversed at higher exposure level. These appear to be the result of solution-physical development of silver complex dissolved from unexposed grains upon adjacent exposed and partially developed grains. The lower the exposure, the more unexposed grains are available for attack by fixing agents and the smaller is the number of exposed grain available for the deposition of the silver from the solution.

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Details 詳細情報について

  • CRID
    1390001206568470016
  • NII Article ID
    130004283440
  • DOI
    10.11454/photogrst1964.35.161
  • ISSN
    18845932
    03695662
  • Data Source
    • JaLC
    • CiNii Articles
  • Abstract License Flag
    Disallowed

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