Design of Photosensitive Materials Using Keto-oxime. Application of Copolymers of Benzylmonooxime Methacrylate to Posi-type Photopolymer.

DOI
  • NAITO Ikuo
    Department of Photography, Faculty of Art, Kyushu Sangyo University
  • SAITO Shinya
    Department of Photography, Faculty of Art, Kyushu Sangyo University
  • HASEME Akiharu
    Department of Photography, Faculty of Art, Kyushu Sangyo University
  • NISHIGABIRAKI Hajime
    Department of Photography, Faculty of Art, Kyushu Sangyo University

Bibliographic Information

Other Title
  • ケトオキシムを利用した感光材料の設計　（ＩＩ）　ベンジルモノオキシムメタクリレート共重合のポジ型感光材料への応用
  • Application of Copolymers of Benzylmonooxime Methacrylate to Posi-type Photopolymer
  • ベンジルモノオキシムメタクリレート共重合のポジ型感光材料への応用

Description

Photodegradations of the copolymer of benzylmonooxime methacrylate (BIMA) with methyl methacrylate (MMA) or t-butyl methacrylate (BMA) were studied for application to photosensitive materials. The absorbance at λmax (=254 nm) and the molecular weights of the copolymers decreased drastically according to the irradiation time. Quantum yields of main chain degradation were estimated to be 0.07 (MMA copolymers) and 0.19 (BMA copolymers). The photoreactivity of MMA-BMA-BIMA terpolymer (BIMA, 1-2 mol% in polymer) increased with increasing BMA unit in the copolymer. The reactions were also carried out in film state. The sensitivities of the copolymers containing over 60 mol% of BMA unit were determined to ca. 20 (293 K) and 10 mJ cm-2 (423 K)

Journal

Details 詳細情報について

  • CRID
    1390001206569354624
  • NII Article ID
    130004284310
  • DOI
    10.11454/photogrst1964.61.268
  • ISSN
    18845932
    03695662
  • Text Lang
    ja
  • Data Source
    • JaLC
    • CiNii Articles
  • Abstract License Flag
    Disallowed

Report a problem

Back to top