Recent progress and future prospects of AlGaN-based deep-UV LEDs
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- HIRAYAMA Hideki
- RIKEN JST-CREST
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- FUJIKAWA Sachie
- RIKEN JST-CREST
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- TSUKADA Yusuke
- RIKEN Saitama University JST-CREST
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- KAMATA Norihiko
- Saitama University JST-CREST
Bibliographic Information
- Other Title
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- AlGaN系深紫外LEDの進展と展望
- AlGaNケイ シンシガイ LED ノ シンテン ト テンボウ
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Abstract
<p>We demonstrated 220-350-nm-band AlGaN-based deep-ultraviolet (DUV) light-emitting diodes (LEDs). Low threading-dislocation density (TDD) AlN buffer layers were realized by using an ammonia (NH3) pulse-flow multilayer (ML) growth technique. We achieved a significant increase in the internal quantum efficiency (IQE) of AlGaN quantum well (QW) emission from about 0.5% to more than 50% by reducing the TDD. We also achieved a significant increase in electron injection efficiency (EIE) by introducing multiquantum barriers (MQBs). We then obtained about 4% external quantum efficiency (EQE) and 30mW cw output power for sterilization-use wavelength DUV LEDs.</p>
Journal
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- Oyo Buturi
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Oyo Buturi 80 (4), 319-324, 2011-04-10
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390001277357306368
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- NII Article ID
- 10027969857
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- NII Book ID
- AN00026679
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- ISSN
- 21882290
- 03698009
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- NDL BIB ID
- 11069204
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- CiNii Articles
- KAKEN
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- Abstract License Flag
- Disallowed