Development of Photosensitive Surface Modifying Agents Containing 2-Nitrobenzyl Group for Printed Electronics

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  • Yamaguchi Kazuo
    Kanagawa University, Faculty of Science, Department of Chemistry
  • Igari Takuma
    Kanagawa University, Faculty of Science, Department of Chemistry

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  • プリンテッドエレクトロニクスのための2-ニトロベンジル基を含む光応答性表面修飾剤の開発
  • プリンテッドエレクトロニクス ノ タメ ノ 2-ニトロベンジルキ オ フクム ヒカリ オウトウセイ ヒョウメン シュウショクザイ ノ カイハツ

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Abstract

<p>Photosensitive surface modifier of silane coupling agents bearing carboxylic acid and amine protected by 2-nitrobenzyl group at the terminal was developed. Self-assembled monolayers were fabricated using these modifiers on the surface of silicon wafer and glass substrates followed by near UV irradiation with photomask to successfully obtain a patterning with a line width of 10 μm. The patterning was confirmed by staining with silver nanoparticulate and fluorescence agent. Development of photosensitive phosphonic acid derivatives as a novel surface modifying agent is also reported.</p>

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