Influence of non-uniform interface defect distribution on channel mobility in SiC MOSFET — Study based on local DLTS measurement and device simulation —
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- Yamasue Kohei
- Tohoku Univ.
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- Yamagishi Yuji
- Tohoku Univ.
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- Cho Yasuo
- Tohoku Univ.
Bibliographic Information
- Other Title
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- 不均一な界面欠陥分布がSiC MOSFETのチャネル移動度に及ぼす影響 ― 局所DLTS測定とデバイスシミュレーションに基づく検討 ―
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2019.2 (0), 3636-3636, 2019-09-04
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390011340284680320
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC