Growth of ferroelectric semiconductor SbSI thin films by molecular beam epitaxy
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- Inagaki Sotaro
- Univ. of Tokyo
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- Nakamura Masao
- RIKEN-CEMS JST-PRESTO
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- Hatada Hiroki
- Univ. of Tokyo
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- Nishino Ryutaro
- Univ. of Tokyo
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- Kagawa Fumitaka
- Univ. of Tokyo RIKEN-CEMS
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- Tokura Yoshinori
- Univ. of Tokyo RIKEN-CEMS
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- Kawasaki Masashi
- Univ. of Tokyo RIKEN-CEMS
Bibliographic Information
- Other Title
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- 分子線エピタキシー法による強誘電体SbSI薄膜の作製
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2019.2 (0), 1392-1392, 2019-09-04
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390011340291878400
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC