MOCVD deposition of Fe-doped NiO films using Tris(2,4-pentanedionato)iron(Ⅲ) as Fe source
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- Sakai Shungo
- Shibaura Inst. of Tech.
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- Taguchi Kentaro
- Shibaura Inst. of Tech.
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- Fujiwara Kazuki
- Shibaura Inst. of Tech.
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- Ishikawa Hiroyasu
- Shibaura Inst. of Tech. SIT Research Center for Green Innovation
Bibliographic Information
- Other Title
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- Fe源としてトリス(2,4-ペンタンジオナト)鉄(III)を用いたMOCVD法によるFeドープNiO薄膜の作製
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2017.1 (0), 3943-3943, 2017-03-01
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390012711638768768
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC