Fabrication of CrFeCoNiSi High Entropy Alloys Dispersed with Silicon Compounds by Low-Pressure Plasma Spraying
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- Hoshiyama Yasuhiro
- Department of Chemistry and Materials Engineering, Faculty of Chemistry, Materials and Bioengineering, Kansai University
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- Hamamoto Daichi
- Graduate School of Science and Engineering, Kansai University
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- Maruoka Tomoki
- Kyoto Municipal Institute of Industrial Technology and Culture
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<p>We aimed to fabricate CrFeCoNiSi HEA deposits dispersed with Si compounds by low-pressure plasma spraying, and we evaluated the structure and properties of the alloy deposits. A heat treatment was applied to the fabricated alloy deposits, and the formation process of precipitates in HEAs was investigated. We fabricated HEA deposits without segregation on substrates with and without water-cooling. The fcc solid solution existed in the as-sprayed deposits and heat-treated deposits. Si compounds were dispersed in the deposits. The precipitates became coarser as the heat-treatment temperature increased. The 873 K heat-treated deposits had the highest hardness both with and without water-cooling. Nanoscale precipitates were formed inside the crystal grains in the as-sprayed deposits with water-cooling. The 1273 K heat-treated deposits satisfied the definition of HEAs.</p>
収録刊行物
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- MATERIALS TRANSACTIONS
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MATERIALS TRANSACTIONS 64 (12), 2826-2830, 2023-12-01
公益社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390016803389980416
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- NII書誌ID
- AA1151294X
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- ISSN
- 13475320
- 13459678
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- NDL書誌ID
- 033193589
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
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- 抄録ライセンスフラグ
- 使用不可