Effect of Heat Treatment on Microstructure of Silicon-containing CrFeCoNi High Entropy Alloys Produced by Low-Pressure Plasma Spraying
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- HOSHIYAMA Yasuhiro
- Department of Chemistry and Materials Engineering, Faculty of Chemistry, Materials and Bioengineering, Kansai University
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- BESSHO Kanta
- Graduate School of Science and Engineering, Kansai University
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- MARUOKA Tomoki
- Kyoto Municipal Institute of Industrial Technology and Culture
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<p>We produced silicon-containing CrFeCoNi high-entropy alloy (HEA) deposits using the low-pressure plasma spraying method and assessed their structural and characteristic properties. The alloy deposits, once manufactured, underwent a heat treatment process, during which we closely examined the formation of precipitates. These HEAs were fabricated on substrates, regardless of whether they were subjected to water-cooling or not. In the case of both deposits acquired with and without water-cooling of the substrates, diffraction peaks corresponding to the face-centered cubic (FCC) phase were clearly observed when subjected to high temperature heat treatment at 1273 K. Additionally, we identified the presence of silicon-containing compounds on the deposits. As the heat-treatment temperatures increased, we observed the coarsening of the precipitates. Notably, within the crystal granules of the water-cooled as-sprayed deposits, nanoscale precipitates were generated. Among all the samples, deposits heat-treated at 973 K exhibited the highest precipitate area fraction and hardness. This suggests a correlation between the heat treatment temperature and the resulting properties of the HEA deposits, with 973 K being the point at which the highest precipitate area fraction and hardness were achieved.</p>
収録刊行物
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- 粉体および粉末冶金
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粉体および粉末冶金 71 (1), 3-9, 2024-01-15
一般社団法人 粉体粉末冶金協会
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詳細情報 詳細情報について
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- CRID
- 1390017345599782144
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- NII書誌ID
- AN00222724
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- ISSN
- 18809014
- 05328799
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- NDL書誌ID
- 033283464
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
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- 抄録ライセンスフラグ
- 使用不可