書誌事項
- タイトル別名
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- Preparation of SOFC Grown by Helicon Wave Excited Plasma Sputtering. Energy Control of Helicon Wave Excited Plasma.
- ソクホウ ヘリコンハレイキプラズマスパッタホウ ニ ヨル コタイ デンカイシツガタ ネンリョウ デンチ ノ サクセイ ヘリコンハレイキプラズマ ノ エネルギー セイギョ
- Energy Control of Helicon Wave Excited Plasma
- ヘリコン波励起プラズマのエネルギー制御
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抄録
Helicon wave excited plasma (HWP) using m = +1 mode antenna and RF of 13.56 MHz has been newly applied for electrolyte film growth of solid oxide fuel cell (SOFC). The HWP could generate higher plasma density by lower magnetic filed and expected the film growth with a high sputtering rate. The energy control of HWP having these feasible properties was investigated on dependencies of various magnetic fields. The abrupt density increase to 1012 cm-3 was observed at near the antenna under the conditions of small magnetic field of 100 G and RF power of 300 W. This high density plasma was found to be excited by the helicon wave with 1/21 wave length. It was also found from spectroscopy measurement that zirconia particles were sputtered from 8 mol% electrolyte, and HWP could be sufficiently applied to the sputtering growth of SOFC.
収録刊行物
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- 真空
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真空 44 (5), 539-543, 2001
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390282679040009728
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- NII論文ID
- 10007389428
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- NII書誌ID
- AN00119871
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- ISSN
- 18809413
- 05598516
- http://id.crossref.org/issn/05598516
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- NDL書誌ID
- 5797292
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可