書誌事項
- タイトル別名
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- Observation by Extremely-low-current Low Energy Electron Diffraction of the Physisorbed Rare Gas Layer Growth.
- キョク ビショウ デンリュウ テイソク デンシセン カイセツホウ ニヨル キガ
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We have developed an eXtremely-low-current Low Energy Electron Diffraction (XLEED) apparatus equipped with a micro-channel plate and a position-sensitive detector which reduces electron beam damage and charge-up effects and makes it possible to study the structure of physisorbed films. This XLEED system is combined with the ellipsometer system which monitors the thickness of a physisorbed film. We observed Xe overlayer on Ag (111) and grahpite (0001) surfaces. We found that a thick Xe films on Ag (111) showed a single crystal structure which keeps relative orientation to the substrate.
収録刊行物
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- 真空
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真空 41 (4), 452-457, 1998
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390282679041286784
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- NII論文ID
- 10001958194
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- NII書誌ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL書誌ID
- 4501802
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可