Vacuum Electron Sources. Fabrication of Integrated Field Emitters.
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- KANEMARU Seigo
- Electrotechnical Laboratory
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- ITOH Junji
- Electrotechnical Laboratory
Bibliographic Information
- Other Title
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- 真空と電子源 集積型電界放出電子源の製作
- シュウセキガタ デンカイ ホウシュツ デンシゲン ノ セイサク
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Description
We have fabricated three types of silicon (Si) field emitters that consist of a Si conical tip and niobium gate electrodes, as follows. (1) An np-type emitter, in which an np junction is built by using ion implantation, exhibits photosensitive field emission. (2) A MOSFET-structured field emitter consists of an emitter tip and a built-in MOSFET. This device exhibits remarkable stability and controllability of emission current. (3) A double-gated field emitter has a vertical triode structure consisting of a conical Si tip and two gates surrounding the tip. The upper gate operates as a focusing lens to generate focused electron beams.
Journal
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- Shinku
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Shinku 41 (4), 434-439, 1998
The Vacuum Society of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390282679041308416
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- NII Article ID
- 10001958128
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- NII Book ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL BIB ID
- 4501799
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed