Structure of Platinum and Carbon Composite Thin Films Prepared by Plasma Sputtering Method

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Other Title
  • プラズマスパッタ法によるＰｔ‐Ｃ複合薄膜の作製と構造評価
  • プラズマスパッタ法によるPt-C複合薄膜の作製と構造評価
  • プラズマスパッタホウ ニ ヨル Pt C フクゴウ ハクマク ノ サクセイ ト コウゾウ ヒョウカ

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Description

  Nano-particle of Pt is essential for a fabrication of high performance catalysts. It was tried to control particle size of nano-particle of Pt by preparing platinum and carbon (Pt-C) composite thin films. Pt-C composite thin films have been deposited by plasma sputtering method using methane/argon mixture gas. The sputtering voltage varied from 100 to 1000 V, the partial pressure of the methane gas varied from 0 to 1.0×10-1 Pa, the total gas pressure of the methane and argon mixture was fixed at 1.8×10-1 Pa. A high-purity platinum metal was used as a sputtering target. The electrical property of Pt-C composite thin films can be changed from metallic to dielectric according to the preparation conditions of the sputtering voltage and the partial pressure of the methane. These composite thin films have various structures, consist of nano-scale particles of Pt crystallites. The designed catalysts of the Pt-C composite thin films comprising nano Pt particles will be possibly obtained by optimizing the partial pressure of the methane and the sputtering voltage.<br>

Journal

  • Shinku

    Shinku 49 (12), 763-766, 2006

    The Vacuum Society of Japan

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