Improvement of Photocatalytic Efficiencies of Rutile TiO2 by Metal Negative Ion Implantation.
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- TSUJI Hiroshi
- Department of Electronic Scinece and Engineering, Kyoto University
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- SUGAHARA Hiromitsu
- Department of Electronic Scinece and Engineering, Kyoto University
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- SAGIMORI Tomohiko
- Department of Electronic Scinece and Engineering, Kyoto University
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- MOTONO Masanori
- Department of Electronic Scinece and Engineering, Kyoto University
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- GOTOH Yasuhito
- Department of Electronic Scinece and Engineering, Kyoto University
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- ISHIKAWA Junzo
- Department of Electronic Scinece and Engineering, Kyoto University
Bibliographic Information
- Other Title
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- 金属負イオン注入による二酸化チタンルチルの光触媒効率の改善
- キンゾクフイオン チュウニュウ ニ ヨル 2サンカ チタン ルチル ノ ヒカリ ショクバイ コウリツ ノ カイゼン
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Abstract
Photocatalytic properties of Cu negative-ion implanted TiO2 (rutile) were investigated as well as light absorption properties due to surface plasmon resonance of Cu nanoparticles in TiO2. Cu negative ions were implanted into TiO2 at 50 keV and also catalytic efficiencies were measured by decolorization method of methylene blue solution. After thermal treatment at 400°C, implanted sample showed an optical absorption peak at a photon energy 1.9 eV. This photon energy of absorption peaks well agreed with an estimate value of surface plasmon resonance calculated by Mie's theory with n = 2.71. In the catalytic test with methylene blue under irradiation of a fluorescent light, Cu-implanted rutile (50 keV, 7 × 1016 ions/cm2, 400°C annealed) showed 1.8 times the catalytic efficiency of the unimplanted rutile.
Journal
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- Shinku
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Shinku 45 (3), 177-180, 2002
The Vacuum Society of Japan
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Details 詳細情報について
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- CRID
- 1390282679041435520
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- NII Article ID
- 10008202886
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- NII Book ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL BIB ID
- 6144192
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed