Electrical Conductivity of Co Thin Films at Low Temperature.
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- YAKABE Taro
- National Institute for Materials Science
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- TERAI Yoshikazu
- National Institute for Materials Science
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- YASUZUKA Syuma
- National Institute for Materials Science Hokkaido University
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- TERAKURA Chieko
- National Institute for Materials Science
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- TERASHIMA Taichi
- National Institute for Materials Science
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- UJI Shinya
- National Institute for Materials Science
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- FUJITA Daisuke
- National Institute for Materials Science
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- KIDO Giyuu
- National Institute for Materials Science
Bibliographic Information
- Other Title
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- Co薄膜の低温における電気伝導特性
- Co ハクマク ノ テイオン ニ オケル デンキ デンドウ トクセイ
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Abstract
The electrical conductivities of Co thin films with the thickness in the range 2.530 nm have been studied. In the low temperature region, the sheet conductivities for the films of 3.05.0 nm show logarithmic temperature dependence. The dependence is interpreted by the electron-electron interaction effect rather than the weak localization effect. The coefficient of the logarithmic behavior is found to be suppressed as the thickness decreases, which may be interpreted in terms of the percolation effect.
Journal
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- Shinku
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Shinku 45 (3), 235-238, 2002
The Vacuum Society of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390282679041531008
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- NII Article ID
- 10008203040
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- NII Book ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL BIB ID
- 6144548
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed