書誌事項
- タイトル別名
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- Study of Heterogenious Reaction between SiHCl3 and Adsorbed H2O on Stainless Steel Surface by Lasr Diode Spectroscopy.
- ハンドウタイ レーザ ブンコウ ニ ヨル ステンレス ジョウ キュウチャクスイ ト トリクロロシラン ノ フキンイツケイ ハンノウ ノ ケンキュウ
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HCl generation by heterogenious reaction between SiHCl3 and adsorbed H2O on a surface of SUS filter is measured by laser diode spectroscopy. H2O concentration on the filter surface is conditioned by heating up the filter, followed by supplying HCl and H2O at the same time. This process prepares nearly mono-molecular H2O adsorption layer on the filter surface. The amount of HCl generated by SiHCl3 flow on the surface with H2O adsorption is 2 orders of magnitude higher than that expected by the reaction; 2SiHCl3 + H2O→+SiHCl2-O-SiHCl2+ 2HCl.<BR>Furthermore, similar HCl generation is found when SiHCl3 is firstly used after cylinder installation with standard purging process. These results strongly suggests that a very small amount of H2O can initiate a chain reaction involving SiHCl3, which may brings about a hazardous by-products on semiconductor processes.
収録刊行物
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- 真空
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真空 42 (6), 628-632, 1999
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390282679041763328
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- NII論文ID
- 10004568097
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- NII書誌ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL書誌ID
- 4773274
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可