Deposition Equipment for X-ray Reflective Films and Characterization of the Films.

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Other Title
  • Ｘ線反射膜形成装置と反射膜特性
  • Xセン ハンシャ マク ケイセイ ソウチ ト ハンシャ マク トクセイ

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Abstract

To fabricate highly reflective X-ray mirrors coated with metal films, we have developed a deposition system equipped with an electron cyclotron resonance (ECR) ion source to irradiate a substrate with low-energy ions as well as to sputter the metal target. The ECR ion source has been designed to avoid depositing a metal film onto a microwave-introducing window. This design has enabled us to stably deposit metal films, suggesting wide-area X-ray mirrors. A platinum film with a surface roughness of 0.3 nm has been deposited by means of this equipment, which should ensure high-reflectivity X-ray mirrors.

Journal

  • Shinku

    Shinku 36 (1), 32-39, 1993

    The Vacuum Society of Japan

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