書誌事項
- タイトル別名
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- Thickness measurements of Al films with X-ray fluorescence.
- ケイコウ Xセン ニ ヨル AL マクアツ ソクテイ
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抄録
The thickness of Al thin films on 1000Å SiO2 was estimated by using X-ray fluorescence (XRF). It was found thatÅ when the films were less than 1000Å thick, the number of Al XRF counts was directly proportional to the Al thickness. Therefore, Al thickness is given by t=a(If-Bg) within an error of 3.0%, where a and Bg are constant and background noise, and If is the Al XRF count. In the Al film thicknes range of 2000Å to 1.2 μm, XRF counts vs. Al thickness becomes nonlinear due to Al self-absorption. The Al thickness was given by t=-a·ln(1-(If-Bg/Imax)), where Imax is maximum value measured by Al XRF. The maximum relative error was 1.6%. However, for the Al film thickness range of 1000Å to 2000Å, the relative error was 9.7%.
収録刊行物
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- 真空
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真空 33 (12), 922-927, 1990
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390282679042148864
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- NII論文ID
- 130000862934
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- NII書誌ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL書誌ID
- 3704209
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- 抄録ライセンスフラグ
- 使用不可