Cross-Sectional Structure of Bi Films and Its Phenomenalistic Analysis

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  • NAMBA Yoshikatsu
    Department of Electrical Engineering, Tokyo University of Agriculture and Technology
  • MORI Toshio
    Department of Electrical Engineering, Tokyo University of Agriculture and Technology
  • TACHIKAWA Michio
    大分工業高等学校電気工学科

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Other Title
  • Bi蒸着膜の断面構造とその現象論的解析
  • Bi ジョウチャク マク ノ ダンメン コウゾウ ト ソノ ゲンショウロンテキ カイセキ

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Description

The cross-sectional structure of evaporated Bi films has been investigated electron-microscopically by means of the replica technique. Films were prepared with changing the evaporation conditions : substrate temperature, residual gas pressure and deposition rate. The influence of deposition rate appears most conspicuously at the thickness where the film becomes continuous. The structure of the film surface is essentially determined at this stage. Based on these results, the phenomenalistic treatment was also made by assuming that the deformation of surface takes place due to the surface diffusion of evaporated atoms. It has been shown that the theoretical result as a function of temperature and deposition rate agrees well with the experimental one.

Journal

  • Shinku

    Shinku 16 (2), 62-68, 1973

    The Vacuum Society of Japan

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