Measurement of Au Sputtering Yields by Neon with Low-Energy Mass Analyzed Ion Beam System

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  • HINE Kiyohiro
    Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University
  • YOSHIMURA Satoru
    Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University
  • KIUCHI Masato
    Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University National Institute of Advanced Industrial Science and Technology (AIST)
  • HAMAGUCHI Satoshi
    Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University

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Other Title
  • 低エネルギー質量分離イオンビーム照射装置を用いたネオンによる金のスパッタ率の測定
  • テイエネルギー シツリョウ ブンリ イオン ビーム ショウシャ ソウチ オ モチイタ ネオン ニ ヨル キン ノ スパッタリツ ノ ソクテイ

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Abstract

  The Au sputtering yields by Ne ions were measured in the range of low injection energy with a low-energy mass analyzed ion beam system. For the ion beam characterization, the mass and energy spectra of the Ne ion beams were measured with a plasma process monitor (Balzers, PPM421) and it was found the Ne beams were essentially monochromatic. The ion beam was injected into an Au thin film prepared on a quartz crystal microbalance (QCM) and its sputtering yield was evaluated from the Au mass decrement. It has been found that the measured Au sputtering yields by Ne ion beams in the energy range of 100-200 eV approximately agree with the previously reported corresponding values. The sputtering yields were also measured for the injection energies below 100 eV. The threshold energy for Au sputtering by Ne estimated from the low energy data is 35 eV.<br>

Journal

  • Shinku

    Shinku 50 (3), 217-219, 2007

    The Vacuum Society of Japan

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