書誌事項
- タイトル別名
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- Electrodeposition of Chromium from Divalent Chromium Baths Containing Formic Acid.
- ギサン オ フクム 2カ クロム デンカイヨク カラ ノ クロム デンセキ
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説明
The electrodeposition of chromium from divalent chromium based baths has not been thoroughly investigated, due to the highly transient and unstable nature of Cr (II) ions. The electrodeposition of chromium from a variety of divalent chromium baths was examined to establish conditions suitable for chromium plating. Divalent chromium baths were prepared by electrolytic reduction of aqueous Cr2(SO4)3 solution using a titanium cathode. Lustrous chromium deposition was obtained by electrodeposition at a cathode potential of -1.1V vs SHE, using aqueous 0.8kmol m-3 CrSO4 -2.0kmol m-3 KCl-0.1kmol m-3 HCOOH (pH 1.8). For 30min of deposition, the average current efficiency for chromium deposition was 25.4%. The average deposit thickness was 10.8μm. The HCOOH concentration suitable for chromium deposition from divalent chromium baths, is much lower than that from trivalent chromium bathes. The main role of the organic acid is to control the pH in the vicinity of the cathode surface.
収録刊行物
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- 表面技術
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表面技術 47 (3), 245-249, 1996
一般社団法人 表面技術協会
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詳細情報 詳細情報について
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- CRID
- 1390282679090465536
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- NII論文ID
- 10002255877
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- NII書誌ID
- AN1005202X
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- COI
- 1:CAS:528:DyaK28XhvFCqtb0%3D
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- ISSN
- 18843409
- 09151869
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- NDL書誌ID
- 3936738
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDLサーチ
- Crossref
- CiNii Articles
- OpenAIRE
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- 抄録ライセンスフラグ
- 使用不可
