Application of Electrochemical Quartz Crystal Microbalance to an Electroplating Monitor.

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  • ＥＱＣＭのめっきモニターへの応用
  • EQCM ノ メッキ モニター エ ノ オウヨウ

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The frequency change in EQCM was measured in an application to the monitoring of the thickness of nickel electroplating. The monitored thickness depended on the type of plating bath and the plating current density, which affected the stress in the plated film and the adhesive force between the gold film electrode and quartz. Mass sensitivity (Sm) in a simplified Sauerbrey equation, Δf=Sm·Δm, changed with the plating current density and the amount of plated metal. This result is related to the radial mass sensitivity of the EQCM electrode because plated nickel film was concave. Sm must therefore be determined experimentally.

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