Preparation of Thin-Films by Wet Method-Their Structure and Properties. Preparation of Iridium Oxide Films for ECD by Electrodeposition.
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- YOSHINO Takako
- Graduate School of Eng., Tokyo Metropolitan Univ.
Bibliographic Information
- Other Title
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- 湿式法による化合物薄膜の作製・構造と物性 電解法によるECD用イリジウム酸化物薄膜の作製
- デンカイホウ ニヨル ECDヨウ イリジウム サンカブツ ハクマク ノ サクセ
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Journal
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- Journal of The Surface Finishing Society of Japan
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Journal of The Surface Finishing Society of Japan 49 (1), 20-24, 1998
The Surface Finishing Society of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390282679091163520
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- NII Article ID
- 10002108372
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- NII Book ID
- AN1005202X
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- ISSN
- 18843409
- 09151869
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- NDL BIB ID
- 4367216
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles