書誌事項
- タイトル別名
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- Simplification in the Preparation for Microstructural Examination of Long-Term Crept SUS316H Steel by Micro-Sputtering Technique.
- マイクロ スパッタリング ニ ヨル SUS316H コウ クリープ シケンザイ ノ キンゾク ソシキ カンサツ ノ タメ ノ ケンマ コウテイ ノ カンリャクカ
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抄録
Micro-sputtering technique was applied to advanced etching method instead of conventional chemical methods for microscopic examination of metallic materials. It was necessary to produce precise microstructures by suitable etching, and the surfaces to be chemically etched were prepared after a 3-step coarse polishing process, that is, grinding using the polishing paper of 100, 60 and 30μm particles, followed by a further 3-step fine polishing process, that is, buffing using the diamond of 6 and 1μm particles and the alumina of 0.05μm particles. This paper describes the attempt to reduce the number of steps required during the polishing stage.<br>Polishing with diamond of 6μm particles without use of diamond of 1μm particles and alumina of 0.05μm particles was performed. Consequently, when performing micro-sputtering for 10 minutes, shallow scratches left during polishing have disappeared completely, and a clear microstructure was shown. Moreover, by micro-sputtering for 20 minutes, although some scratches remained, there was no trouble in microstructual observation with the coarse polishing up to 30μm which means an appreciable reduction in polishing processes.
収録刊行物
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- 表面技術
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表面技術 52 (10), 698-701, 2001
一般社団法人 表面技術協会
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詳細情報 詳細情報について
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- CRID
- 1390282679091551872
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- NII論文ID
- 10007559402
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- NII書誌ID
- AN1005202X
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- ISSN
- 18843409
- 09151869
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- NDL書誌ID
- 5963230
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可