書誌事項
- タイトル別名
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- Pretreatment for Void-Free Electroless Copper Plating.
- ボイドフリー ムデンカイ ドウ メッキ ノ マエショリ ニ ツイテ
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説明
Plating failures such as skip plating and miss plating in small through holes on a printed circuit board can be eliminated by modification of the acceleration solution.<br>These failures were greatly diminished without adhesion failure between the deposited copper and copper foil by the addition of a reducing agent such as hydrazine sulfate, hydroxylamine sulfate, DMAB or sodium hypophosphite into the sulfuric acid acceleration solution.<br>Anodic polarization curves showed that the activity of the palladium catalyst was increased by these reducing agents.<br>Conditioning treatment with a cation-based surface active agent enhanced the coverage of the palladium catalyst on the glass layer and lead to avoidance of these failures.<br>Control of the dissolved oxygen in the electroless copper solution was also effective in suppressing these phenomena.
収録刊行物
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- 表面技術
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表面技術 43 (6), 595-600, 1992
一般社団法人 表面技術協会
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詳細情報 詳細情報について
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- CRID
- 1390282679091627520
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- NII論文ID
- 130001072835
- 10003868707
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- NII書誌ID
- AN1005202X
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- COI
- 1:CAS:528:DyaK38XkvFGjt74%3D
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- ISSN
- 18843409
- 09151869
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- NDL書誌ID
- 3773350
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDLサーチ
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- 抄録ライセンスフラグ
- 使用不可