Special Issue/Recent Trend and Future of Photoresists for Microlithography. Trend of High Resolution for Positive Photoresists.
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- ASAUMI Shingo
- Tokyo Ohka Kogyo Co., Ltd.
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- OSAKA Tetsuya
- School of Sci. and Eng., Waseda Univ.
Bibliographic Information
- Other Title
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- 小特集 フォトレジストと微細加工技術 ポジ型フォトレジストの高解像化の動向
- ポジガタ フォトレジスト ノ コウ カイゾウカ ノ ドウコウ
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Journal
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- Journal of The Surface Finishing Society of Japan
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Journal of The Surface Finishing Society of Japan 44 (6), 473-477, 1993
The Surface Finishing Society of Japan
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Details 詳細情報について
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- CRID
- 1390282679092136448
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- NII Article ID
- 130001072363
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- NII Book ID
- AN1005202X
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- ISSN
- 18843409
- 09151869
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- NDL BIB ID
- 3824213
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles