Effect of Complexing Agents on Electroless NiB Plating.
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- KIM Man
- Materials Processing Div., Korea Inst. of Machinery and Materials
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- HIGASHIKAWA Taichi
- School of Sci., Waseda Univ
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- IIZUKA Atsushi
- Advanced Res Center for Sci and Eng, Waseda Univ
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- OSAKA Tetsuya
- School of Sci., Waseda Univ Advanced Res Center for Sci and Eng, Waseda Univ
Bibliographic Information
- Other Title
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- 無電解NiBめっきにおける錯化剤の影響
- ムデンカイ NiB メッキ ニ オケル サクカザイ ノ エイキョウ
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Description
The effect of four complexing agents-sodium citrate, sodium malonate, glycine and diethylenetriamine-on electroless NiB plating using dimethylamine-borane (DMAB) as a reducing agent was studied. The deposition rate was influenced by the pH, DMAB concentration, and the complexing agent species. The B and C content of deposited films, in particular, was strongly influenced by the complexing agent species. The B content of film deposited from a sodium citrate bath in a pH of 6.5 and 003mol dm-3 DMAB concentration was the highest -5.41wt%-, while the C content was lower -01wt%-. The C content of film deposited from a diethylenetriamine bath at a pH 7.5 and the same DMAB concentration as given above was, in contrast, the highest -0.29wt%-, and the B content was lower -1.34wt%-. XRD results indicated that, in our study, as-deposited films showed an amorphous structure when the condition was such that the boron content was more than 2.5wt%. Such as-deposited films were crystallized by heat treatment at 300°C for 1hr. The lattice distance of Ni (111) was shifted from 0.2017nm to 0.2032nm, and the content of C was found to have increased.
Journal
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- Journal of The Surface Finishing Society of Japan
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Journal of The Surface Finishing Society of Japan 48 (11), 1099-1104, 1997
The Surface Finishing Society of Japan
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Details 詳細情報について
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- CRID
- 1390282679092591616
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- NII Article ID
- 10002260227
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- NII Book ID
- AN1005202X
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- ISSN
- 18843409
- 09151869
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- NDL BIB ID
- 4334600
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed