書誌事項
- タイトル別名
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- Low Friction Property of DLC-Si Films under Dry Sliding Condition
- 大気中無潤滑下におけるDLC-Si膜の低摩擦特性
- タイキチュウ ムジュンカツカ ニ オケル DLC Si マク ノ テイマサツ トクセイ
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説明
The aim of this study is to examine the effect of silicon in DLC-Si films on friction properties, and to clarify the mechanism of low friction under dry sliding conditions. The friction coefficient of DLC-Si films was measured using a ball-on-disk type tester at a load of 10N and a sliding velocity of 0.2m/s with no lubricant in an ambient air atmosphere. Compared to DLC films without Si, DLC-Si films exhibited an extremely low friction coefficient (about 0.05) ranging from 4 to 17at. % in silicon. On the wear surface of DLC-Si coated disks, the formation of Si-OH was eventually detected using derivatization-XPS. In order to explain the relation between Si-OH formation and low friction behavior, model samples with Si-OH, Si-H and their mixture on the silicon wafer were prepared, and the friction coefficient of the samples was measured with a ball-on-plate type tester. Compared to Si-H, Si-OH had a lower friction coefficient. Furthermore, Si-OH surface analyzed by ATR-IR showed spectra with broad band at around 3400cm−1, indicating the existence of adsorbed water on the Si-OH surface. From the results obtained, it was suggested that DLC-Si films exhibited a low friction property caused by the formation of Si-OH and adsorbed water in it under the dry sliding condition.
収録刊行物
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- 表面技術
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表面技術 59 (6), 401-407, 2008
一般社団法人 表面技術協会
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詳細情報 詳細情報について
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- CRID
- 1390282679093332992
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- NII論文ID
- 10021170197
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- NII書誌ID
- AN1005202X
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- COI
- 1:CAS:528:DC%2BD1cXntVyitr4%3D
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- ISSN
- 18843409
- 09151869
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- NDL書誌ID
- 9531244
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
