Electroless Deposition of Tin Using Contact with Zinc Powder in the Bath
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- UCHIDA Ei
- ISHIHARA Chemical Co., Ltd.
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- TANAKA Kaoru
- ISHIHARA Chemical Co., Ltd.
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- KAWABATA Ai
- ISHIHARA Chemical Co., Ltd.
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- NABESHIMA Shota
- Frontiers of Innovative research in Science and Technology(FIRST), Konan University
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- TSURUOKA Takaaki
- Frontiers of Innovative research in Science and Technology(FIRST), Konan University
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- AKAMATSU Kennsuke
- Frontiers of Innovative research in Science and Technology(FIRST), Konan University
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- NAWAFUNE Hidemi
- Frontiers of Innovative research in Science and Technology(FIRST), Konan University
Bibliographic Information
- Other Title
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- 亜鉛微粒子の接触を利用する無電解スズめっき
- アエン ビリュウシ ノ セッショク オ リヨウ スル ムデンカイ スズメッキ
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Abstract
Electroless deposition of tin film is an important process, particularly for joining in flexible printed circuit board (FPC) and chip-on-film (COF) tapes. Electroless deposition of tin from the tin (Ⅱ)-citrate bath was investigated using contact with zinc powder in the bath. Tin was deposited electrolessly onto a copper substrate by contact with zinc powder in the tin (Ⅱ)-citrate bath. The process, which is environmentally friendly, provides a high tin deposition rate of approximately 8 μmh−1. That rate is much higher than that of the autocatalytic deposition process using TiCl3 as a reducing agent. Furthermore, no copper substrate dissolution was observed. Results of local polarization curve measurements indicate that the mixed potential theory is applicable to this reaction.
Journal
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- Journal of The Surface Finishing Society of Japan
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Journal of The Surface Finishing Society of Japan 65 (9), 453-457, 2014
The Surface Finishing Society of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390282679094585600
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- NII Article ID
- 130005096761
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- NII Book ID
- AN1005202X
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- ISSN
- 18843409
- 09151869
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- NDL BIB ID
- 025794650
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed