書誌事項
- タイトル別名
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- Electrodeposition and Properties of Gold-Nickel Alloy Film with a Nanocrystalline-Amorphous Mixed Structure
- ビサイ ケッショウ ヒショウシツ コンザイキン ニッケル ゴウキンメッキ マク ノ セキシュツ ジョウケン ト ブッセイ
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説明
As an electrical contact material that is compatible with the recent trend of miniaturization of electronic devices and components, the authors have been investigating electrodeposited amorphous gold alloys with properties that are unaffected by their crystal-grain size, unlike conventional electroplated hard gold. Amorphous alloys in general, however, are known to suffer from high electrical resistivity because of the short mean free path of electrons in such alloys. To resolve this problem, we developed a process of electroplating Au-Ni alloy films with a mixture of nanocrystalline and amorphous phases and investigated the films' physical characteristics. Results show that those Au-Ni films with mixed phases possess low electrical resistivity, retaining corrosion resistance in a range of practical tolerances. The microstructure of the new material of nanocrystalline-amorphous Au-Ni alloy excels in mechanical strength while retaining the properties of Au. Moreover, it is thermally stable at temperatures up to 300°C. Consequently, this new material is expected to be useful as a material for electrical contact surfaces. Furthermore, this study revealed that the electroplated Au-Ni alloy film microstructure is controllable by selecting suitable bath compositions and plating conditions.
収録刊行物
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- 表面技術
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表面技術 62 (8), 397-397, 2011
一般社団法人 表面技術協会
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詳細情報 詳細情報について
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- CRID
- 1390282679095203072
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- NII論文ID
- 10029436525
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- NII書誌ID
- AN1005202X
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- COI
- 1:CAS:528:DC%2BC3MXhtlSrs7%2FM
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- ISSN
- 18843409
- 09151869
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- NDL書誌ID
- 11203667
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- 本文言語コード
- ja
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- 資料種別
- journal article
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- データソース種別
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- JaLC
- NDLサーチ
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- 使用不可