Surface 4f Level Shift in Yb Metal Studied by ARUPS, Hydrogen and Oxygen Exposures, and Work Function Measurement
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- Takakuwa Yuji
- Department of Physics, Faculty of Science, Tohoku University
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- Suzuki Shoji
- Department of Physics, Faculty of Science, Tohoku University
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- Yokotsuka Tatsuo
- Department of Physics, Faculty of Science, Tohoku University
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- Sagawa Takasi
- Department of Physics, Faculty of Science, Tohoku University
書誌事項
- タイトル別名
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- Surface 4f Level Shift in Yb Metal Stud
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抄録
Angle-resolved UPS spectra of 4f levels of Yb metal measured as a function of electron take-off angles have given a direct confirmation that satellite peaks of the 4f levels are due to the surface Yb atoms. Upon oxygen exposure, these surface components of the 4f levels do not show any preferential reduction in intensity and the work function decreases. These suggest the diffusion of adsorbed oxygen atoms underneath the Yb surface. By a mass analysis with hydrogen exposure to the Yb surface, it has been found that the surface is hydrogen free even though the evaporated Yb film contains hydrogen in the bulk. These facts lead to the interpretation that the surface 4f level shift in Yb metal is not hydrogen-induced but intrinsic.
収録刊行物
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- Journal of the Physical Society of Japan
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Journal of the Physical Society of Japan 53 (2), 687-695, 1984
一般社団法人 日本物理学会
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詳細情報 詳細情報について
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- CRID
- 1390282679160670720
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- NII論文ID
- 110001976066
- 210000091849
- 130003739135
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- NII書誌ID
- AA00704814
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- BIBCODE
- 1984JPSJ...53..687T
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- COI
- 1:CAS:528:DyaL2cXhsVOqtbg%3D
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- ISSN
- 13474073
- 00319015
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- NDL書誌ID
- 2968825
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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- 使用不可