Relaxation process in electron spin resonance of Ti-doped VO2
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- Goto Tsuneaki
- Department of Applied Physics, Tokyo Institute of Technology
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- Nishimura Katsuyuki
- Department of Applied Physics, Tokyo Institute of Technology
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- Kabashima Shigeharu
- Department of Applied Physics, Tokyo Institute of Technology
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- Kawakubo Tatsuyuki
- Department of Applied Physics, Tokyo Institute of Technology
書誌事項
- タイトル別名
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- Relaxation Process in Electron Spin Resonance of Ti-Doped VO<SUB>2</SUB>
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抄録
In order to investigate the spin relaxation mechanism in Ti-doped VO2 in relation to the itineracy of electrons associated with Ti impurities substituted for V4+, the linewidth and line intensity of ESR absorption at 24 GHz have been measured on samples doped with various concentrations of Ti in a temperature range between 4.2 and 250 K. The spectrum with hfs lines is observed at low concentration of Ti, while a single narrowed line of absorption is found at higher concentration. The temperature dependence of linewidth and line intensity of this single absorption line are discussed with respect to the staying time of electrons in the impurity state and their motions between impurity centers. The hopping frequency of electrons and the staying time in the impurity state are determined.
収録刊行物
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- Journal of the Physical Society of Japan
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Journal of the Physical Society of Japan 30 (6), 1654-1661, 1971
一般社団法人 日本物理学会
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詳細情報 詳細情報について
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- CRID
- 1390282679172111616
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- NII論文ID
- 110001958285
- 130003893136
- 210000082309
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- NII書誌ID
- AA00704814
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- BIBCODE
- 1971JPSJ...30.1654G
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- COI
- 1:CAS:528:DyaE3MXksVaqsLg%3D
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- ISSN
- 13474073
- 00319015
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- NDL書誌ID
- 8502846
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可