Characterization of Initial Low-Aspect Ratio RFP Plasmas in “RELAX”
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- Masamune Sadao
- Department of Electronics, Kyoto Institute of Technology
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- Sanpei Akio
- Department of Electronics, Kyoto Institute of Technology
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- Ikezoe Ryuya
- Department of Electronics, Kyoto Institute of Technology
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- Onchi Takumi
- Department of Electronics, Kyoto Institute of Technology
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- Murata Ken-Ichi
- Department of Electronics, Kyoto Institute of Technology
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- Oki Kensuke
- Department of Electronics, Kyoto Institute of Technology
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- Shimazu Hiroyuki
- Department of Electronics, Kyoto Institute of Technology
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- Yamashita Tetsuo
- Department of Electronics, Kyoto Institute of Technology
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- Himura Haruhiko
- Department of Electronics, Kyoto Institute of Technology
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説明
A reversed field pinch (RFP) machine with aspect ratio of as low as 2 (R⁄a=0.51 m/0.25 m) has been constructed for the experimental study of new RFP regime. Low-aspect ratio RFP plasmas have been produced in a resistive wall vacuum vessel for the first time. Initial results on discharge characteristics of the low-A RFP plasmas are presented. This experiment serves our study on new RFP regime with expected characteristics of simpler MHD dynamic arising from equilibrium profiles with less densely spaced rational surfaces of the dominant modes, which have been revealed by the recent progress in RFP research.
収録刊行物
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- Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｐｈｙｓｉｃａｌ Ｓｏｃｉｅｔｙ ｏｆ Ｊａｐａｎ
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Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｐｈｙｓｉｃａｌ Ｓｏｃｉｅｔｙ ｏｆ Ｊａｐａｎ 76 (12), 123501-123501, 2007
一般社団法人 日本物理学会
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詳細情報 詳細情報について
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- CRID
- 1390282679172186112
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- NII論文ID
- 130005296613
- 110006532178
- 210000107006
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- NII書誌ID
- AA00704814
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- ISSN
- 13474073
- 00319015
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- NDL書誌ID
- 9304701
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
