書誌事項
- タイトル別名
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- Carbonaceous Thin Films Made by Chemical Vapor Deposition of 2, 5-Dimethyl-p-benzoquinone (1)
- 2 5 ジメチル p ベンゾキノン オ ゲンリョウ ト シタ CVD タンソシ
- Preparation and Structure
- 薄膜の調製と構造
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説明
It was reported that a photovoltaic cell with carbonaceous film/n-type silicon (C/n-Si) was fabricated utilizing a process in which a carbonaceous film was deposited on an n-type silicon substrate by chemical vapor deposition (CVD) of 2, 5- dimethyl-p-benzoquinone at 500°C The purpose of this work is to study preparation and structure of the carbonaceous film. In this study, the carbonaceous films were made by CVD of 2, 5-dimethyl-p-benzoquinone on a quartz substrate at a temperature between 500 and 1000°C. The 2, 5-dimethyl-p-benzoquinone shows higher reaction activity for carbonization at low temperatures. At low CVD temperatures below 700°C, the carbonization reaction of 2, 5- dimethyl-p-benzoquinone was mainly caused by pyrolysis of its methyl and carbonyl groups. The carbonaceous film deposited at low temperatures below 700°C has a typical amorphous structure, and the one deposited above 700°C has a graphite-like lamellar structure oriented along the substrate.
収録刊行物
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- 炭素
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炭素 1997 (178), 101-107, 1997
炭素材料学会
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詳細情報 詳細情報について
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- CRID
- 1390282679204248192
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- NII論文ID
- 130004358320
- 10011186695
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- NII書誌ID
- AN00140335
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- ISSN
- 18845495
- 03715345
- http://id.crossref.org/issn/03715345
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- NDL書誌ID
- 4267790
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可