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- Chun Sung-Yong
- Department of Materials Physics, Osaka National Research Institute, AIST
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- Chayahara Akiyoshi
- Department of Materials Physics, Osaka National Research Institute, AIST
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- Horino Yuji
- Department of Materials Physics, Osaka National Research Institute, AIST
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抄録
A new film fabrication method for metallic alloy has been established using coaxial vacuum arc deposition (CVAD). In our vacuum arc system, because the plasma on the surface of the evaporation source (target) can be controlled by pulsed arc discharge, it is possible to fabricate the films with same compositions as the target and to control the thickness of the Ti–Al film at a nanometer scale. In this report, crystallographic results of the Ti–Al films resulting from changing the substrate and after the heat-treatment is demonstrated.
収録刊行物
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- Materials Transactions, JIM
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Materials Transactions, JIM 41 (1), 44-46, 2000
社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390282679222968832
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- NII論文ID
- 130003557253
- 10005745345
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- NII書誌ID
- AA10699969
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- COI
- 1:CAS:528:DC%2BD3cXhvFSnu7g%3D
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- ISSN
- 2432471X
- 09161821
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- NDL書誌ID
- 4975203
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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- 使用不可