Effects of Annealing Temperature on the Properties of Strontium Copper Oxide Prepared by Radio Frequency Reactive Magnetron Sputtering Method

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  • Liu Jui-wen
    Department of Material Science Engineering, National Cheng Kung University
  • Lee Shih-chin
    Department of Material Science Engineering, National Cheng Kung University
  • Yang Chih-hao
    Department of Material Science Engineering, National Cheng Kung University

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Electrical, structural and optical properties of annealed transparent strontium copper oxide (SCO) films were studied in this paper. These SCO films were first deposited by reactive radio frequency magnetron sputtering technique on glass substrates at room temperature with ultra highly pure oxygen and a 100 W sputtering power, and then annealed at different temperatures ranging from 373 to 723 K in an atmosphere of oxygen controlled at 101 Pa. Results showed that the resistivity increased first as the annealing temperature raised from 373 to 473 K, and then decreased when annealed at 623 K. Carrier density of an annealed film increased from 7.09×1020 cm−3 to 1.21×1021 cm−3 as the annealing temperature increased. Results also showed that the resistivity of a SCO film was highly correlated to the carrier mobility. The highest carrier mobility observed by annealing a SCO film at 623 K was 4.0×10−5 m2 V−1 S−1. The optical transmittance of an annealed SCO film in the visible range at 550 nm fell between 52.6% and 58.2%. The Hall coefficient measured at room temperature indicated the nature of the annealed films was p-type.

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