Preparation of Highly Textured ZnO Thin Films by Pulsed Electron Deposition
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- Zhan Peng
- Advanced Materials Laboratory, Department of Materials Science and Engineering, Tsinghua University
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- Li Zhengcao
- Advanced Materials Laboratory, Department of Materials Science and Engineering, Tsinghua University
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- Zhang Zhengjun
- Advanced Materials Laboratory, Department of Materials Science and Engineering, Tsinghua University
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説明
Pulsed electron deposition is a very promising means for growing high quality thin films even for complicated oxides. By investigating the influence of deposition parameters like the substrate temperature, the oxygen pressure in the chamber, as well as the pulse frequency and energy of the electrons on the growth of ZnO, the evolution of the [0002] orientation has been revealed and highly [0002] oriented ZnO thin films were obtained on Si (100) substrates at suitable conditions.
収録刊行物
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- MATERIALS TRANSACTIONS
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MATERIALS TRANSACTIONS 52 (9), 1764-1767, 2011
公益社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390282679226995200
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- NII論文ID
- 10029530218
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- NII書誌ID
- AA1151294X
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- ISSN
- 13475320
- 13459678
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- NDL書誌ID
- 11225835
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可