Microwave Heating of Thin Au Film

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  • Sueyoshi Hidekazu
    Department of Nano Structure and Advanced Materials, Graduate School of Science and Engineering, Kagoshima University
  • Kakiuchi Shigeki
    Department of Nano Structure and Advanced Materials, Graduate School of Science and Engineering, Kagoshima University

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Thin Au film was prepared by sputtering and evaporation methods with a quartz substrate, followed by microwave irradiation in air (frequency of microwave: 2.45 GHz, incident flux of microwave: 563 W, irradiation time: 600 s). As a result, it was confirmed that microwave heating of thin Au film is feasible. The growth of crystalline and particles due to microwave heating was confirmed from AFM observation and XRD analysis.<BR>Thin Au film is continuously heated during microwave irradiation, regardless of a preparation method of thin film. Microwave heating depends on the amount of microwave absorption on a thin Au film, which is related to the thickness and microstructure of the thin Au film. The rate of temperature rise depends on the ratio of a thickness to resistivity of thin Au film.

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