Emission and Sputtering Characteristics of Ne-Ar Mixed Gas Glow Discharge Plasmas
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- PARK Hyunkook
- Institute for Materials Research, Tohoku University
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- TSUKIJI Machiko
- Institute for Materials Research, Tohoku University
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- WAGATSUMA Kazuaki
- Institute for Materials Research, Tohoku University
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- LEE SangChun
- Department of Chemistry and Chemical Engineering, Kyungnam University
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The emission characteristics of several Cu lines emitted from a Ne-Ar mixed gas glow discharge plasma were investigated. The addition of small amounts of Ar to a Ne plasma increases the sputtering rate of a Cu sample because Ar ions, which work as the impinging ions for cathode sputtering, are predominantly produced through Penning ionization collisions between Ne metastables and Ar atoms. Ar addition also elevates the number density of electrons in the plasma. These changes occurring in the Ne-Ar mixed gas plasma result in enhanced emission intensities of the Cu lines. The Cu II 270.10-nm and the Cu II 224.70-nm lines yield different intensity dependence on the Ar partial pressure added. This phenomenon is because these Cu II lines are excited principally through different charge transfer processes: collisions with Ne ions for the Cu II 270.10-nm line and collisions with Ar ions for the Cu II 224.70-nm line. The shape of sputtered craters in the Ne-Ar glow discharge plasma was measured. The depth resolution was improved when Ar was added to a Ne plasma because the crater bottoms were flatter with larger Ar partial pressures.
収録刊行物
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- Analytical Sciences
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Analytical Sciences 23 (9), 1133-1136, 2007
社団法人 日本分析化学会
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詳細情報 詳細情報について
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- CRID
- 1390282679233031808
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- NII論文ID
- 10019747305
- 130004441544
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- NII書誌ID
- AA10500785
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- ISSN
- 13482246
- 09106340
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- HANDLE
- 10097/51753
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- NDL書誌ID
- 8891042
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- Web Site
- https://tohoku.repo.nii.ac.jp/records/44028
- https://ndlsearch.ndl.go.jp/books/R000000004-I8891042
- https://link.springer.com/content/pdf/10.2116/analsci.23.1133.pdf
- https://link.springer.com/article/10.2116/analsci.23.1133/fulltext.html
- http://www.jstage.jst.go.jp/article/analsci/23/9/23_9_1133/_pdf
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- 本文言語コード
- en
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