-
- Watanabe Takeo
- Laboratory of Advanced Science and Technology for Industry, University of Hyogo
-
- Kinoshita Hiroo
- Laboratory of Advanced Science and Technology for Industry, University of Hyogo
この論文をさがす
抄録
It is reviewed that research and development of resist for extreme ultraviolet lithographic in University of Hyogo. It is focused on the mitigation of the development of high sensitive and low line edge roughness EUV resist. To achieve high sensitivity, it is found that cyclo(1,3-per-fluoropropanedisulfone) imidate employed as an anion of PAG is beneficial in EUV exposure to achieve high sensitivity. To achieve low LER and high sensitivity simultaneously, PAG bonded resist is proposed. We demonstrate Eo sensitivity of higher than 2 mJ/cm2 under EUV exposure. PAG bonded resist which has LER of around 2.0 nm and 6.8 μC/c2 are demonstrated. Furthermore, design concept of low outgassing resist is introduced.
収録刊行物
-
- Journal of Photopolymer Science and Technology
-
Journal of Photopolymer Science and Technology 20 (3), 373-382, 2007
フォトポリマー学会
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1390282679300474240
-
- NII論文ID
- 130004464558
- 40015602502
-
- NII書誌ID
- AA11576862
-
- COI
- 1:CAS:528:DC%2BD2sXot1Wmsr8%3D
-
- ISSN
- 13496336
- 09149244
-
- NDL書誌ID
- 8918847
-
- 本文言語コード
- en
-
- データソース種別
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- 抄録ライセンスフラグ
- 使用不可