Tailoring Surface Properties of ArF Resists with Functionally Graded Materials (FGM)

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  • Takemoto Ichiki
    IT-Related Chemicals Research Laboratory, Sumitomo Chemical Co. Ltd.
  • Ando Nobuo
    IT-Related Chemicals Research Laboratory, Sumitomo Chemical Co. Ltd.
  • Edamatsu Kunishige
    IT-Related Chemicals Research Laboratory, Sumitomo Chemical Co. Ltd.
  • Fuji Yusuke
    IT-Related Chemicals Research Laboratory, Sumitomo Chemical Co. Ltd.
  • Hashimoto Kazuhiko
    IT-Related Chemicals Research Laboratory, Sumitomo Chemical Co. Ltd.
  • Funase Junji
    IT-Related Chemicals Research Laboratory, Sumitomo Chemical Co. Ltd.
  • Yokoyama Hiroyuki
    IT-Related Chemicals Research Laboratory, Sumitomo Chemical Co. Ltd.

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Our recent research effort has been focused on new top coating-free 193nm immersion resists with regard to leaching of the resist components and lithographic performance. We have examined methacrylate-based resins that control the surface properties of ArF resists thin films by surface segregation behavior. For a better understanding of the surface properties of thin films, we have prepared the six resins (Resin 1-6) that have three types fluorine containing monomers, a new monomer (Monomer A), Monomer B and Monomer C, respectively. We blended the base polymer (Resin 0) with Resin (1-6), respectively. We evaluated contact angles, surface properties and lithographic performances of the polymer blend resists. The static and receding contact angles of the resist that contains Resin (1-6) are greater than that of the base polymer (Resin 0) resist. The chemical composition of the surface of blend polymers was investigated with x-ray photoelectron spectroscopy (XPS) and TOF-SIMS with gradient shaving preparations. It is confirmed that there is significant segregation of the fluorine containing resins to the surface of the blend films. We analyzed Quantitative Structure-Property Relationships (QSPR) between the surface properties and the chemical composition of the surface of polymer blend resists. The addition of 10 wt% of the polymer (Resin 1-6) to the base polymer (Resin 0) did not influence the lithographic performance. Consequently, the surface properties of resist thin films can be tailored by the appropriate choice of fluorine containing polymer blends.

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